JOURNAL ARTICLE

AlInGaAs/AlGaAs strained quantum-well ridge waveguide lasers grown by metalorganic chemical vapor deposition

N.A. HughesJ.C. ConnollyD. B. GilbertK.B. Murphy

Year: 1992 Journal:   IEEE Photonics Technology Letters Vol: 4 (2)Pages: 113-115   Publisher: Institute of Electrical and Electronics Engineers

Abstract

AlInGaAs/AlGaAs strained quantum-well ridge waveguide diode lasers with an emission wavelength of 890 nm are presented. These devices exhibit both single spatial and longitudinal mode operation up to 30 mW of optical output power. A CW threshold current of 13 mA was obtained for a 5- mu m-wide ridge waveguide having a cavity length of 500 mu m. The differential quantum efficiency was 52%. The lateral and perpendicular far-field radiation patterns (FWHM) from the laser were 6 degrees and 51 degrees , respectively. Reliability testing on uncoated gain-guided lasers made from the same wafer showed no sudden death failures and degradation rates as low as 4.6%/kh.< >

Keywords:
Chemical vapor deposition Laser Optoelectronics Metalorganic vapour phase epitaxy Quantum well Materials science Wafer Ridge Waveguide Diode Wavelength Semiconductor laser theory Optics Quantum efficiency Physics Epitaxy Nanotechnology

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Topics

Semiconductor Quantum Structures and Devices
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Semiconductor Lasers and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Photonic and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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