JOURNAL ARTICLE

Polycrystalline silicon films fabricated by rapid thermal annealing

Lei ZhangHonglie ShenJiayi YouFeng JiangTianru WuZhengxia Tang

Year: 2012 Journal:   Journal of Materials Science Materials in Electronics Vol: 23 (7)Pages: 1279-1283   Publisher: Springer Science+Business Media
Keywords:
Crystallinity Raman spectroscopy Materials science Amorphous solid Polycrystalline silicon Annealing (glass) Silicon Crystallite Chemical vapor deposition Scanning electron microscope Thin film Chemical engineering Analytical Chemistry (journal) Composite material Layer (electronics) Nanotechnology Crystallography Optoelectronics Optics Chemistry Metallurgy Thin-film transistor

Metrics

3
Cited By
0.44
FWCI (Field Weighted Citation Impact)
18
Refs
0.69
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Nanowire Synthesis and Applications
Physical Sciences →  Engineering →  Biomedical Engineering

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