Selective growth and characterization of pure, epitaxial α-Fe2O3(0001) and Fe3O4(001) films by plasma-assisted molecular beam epitaxy

Y.J. Kim; Yufei Gao; Scott A. Chambers

doi:10.1016/s0039-6028(96)00999-5

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Selective growth and characterization of pure, epitaxial α-Fe2O3(0001) and Fe3O4(001) films by plasma-assisted molecular beam epitaxy

Y.J. Kim Yufei Gao Scott A. Chambers

Year: 1997 Journal: Surface Science Vol: 371 (2-3)Pages: 358-370 Publisher: Elsevier BV

DOI: 10.1016/s0039-6028(96)00999-5

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Keywords:

Molecular beam epitaxy Electron diffraction X-ray photoelectron spectroscopy Epitaxy Reflection high-energy electron diffraction Low-energy electron diffraction Materials science Analytical Chemistry (journal) Substrate (aquarium) Diffraction Crystal growth Crystallography Chemistry Nanotechnology Chemical engineering Layer (electronics) Optics

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Iron oxide chemistry and applications

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Magnetic properties of thin films

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Selective growth and characterization of pure, epitaxial α-Fe2O3(0001) and Fe3O4(001) films by plasma-assisted molecular beam epitaxy

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