Heteroepitaxial growth of α-Fe2O3, γ-Fe2O3 and Fe3O4 thin films by oxygen-plasma-assisted molecular beam epitaxy

Yufei Gao; Scott A. Chambers

doi:10.1016/s0022-0248(96)01141-4

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Heteroepitaxial growth of α-Fe2O3, γ-Fe2O3 and Fe3O4 thin films by oxygen-plasma-assisted molecular beam epitaxy

Yufei Gao Scott A. Chambers

Year: 1997 Journal: Journal of Crystal Growth Vol: 174 (1-4)Pages: 446-454 Publisher: Elsevier BV

DOI: 10.1016/s0022-0248(96)01141-4

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Keywords:

Molecular beam epitaxy Epitaxy Thin film Electron cyclotron resonance Materials science Analytical Chemistry (journal) Substrate (aquarium) Crystallography Crystal growth Layer (electronics) Chemistry Nanotechnology Ion

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Iron oxide chemistry and applications

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Magnetic properties of thin films

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Heteroepitaxial growth of α-Fe2O3, γ-Fe2O3 and Fe3O4 thin films by oxygen-plasma-assisted molecular beam epitaxy

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