Microstructures of diamond films deposited on (100) silicon wafer by microwave plasma-enhanced chemical vapour deposition

Jung Ho Je; G. Y. Lee

doi:10.1007/bf00576280

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Microstructures of diamond films deposited on (100) silicon wafer by microwave plasma-enhanced chemical vapour deposition

Jung Ho Je G. Y. Lee

Year: 1992 Journal: Journal of Materials Science Vol: 27 (23)Pages: 6324-6330 Publisher: Springer Science+Business Media

DOI: 10.1007/bf00576280

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Keywords:

Materials science Diamond Chemical vapor deposition Silicon Wafer Crystallinity Substrate (aquarium) Nucleation Chemical engineering Deposition (geology) Microstructure Carbon film Composite material Mineralogy Analytical Chemistry (journal) Thin film Nanotechnology Metallurgy Chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Advanced materials and composites

Physical Sciences → Engineering → Mechanical Engineering

Microstructures of diamond films deposited on (100) silicon wafer by microwave plasma-enhanced chemical vapour deposition

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