Micromechanical properties of diamond films deposited by microwave-plasma-enhanced chemical vapour deposition

Adan Garcia; N. Flaño; J.L. Viviente; J.I. Oñate; C. Gómez‐Aleixandre; O. Sánchez

doi:10.1016/0925-9635(93)90253-x

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Micromechanical properties of diamond films deposited by microwave-plasma-enhanced chemical vapour deposition

Adan Garcia N. Flaño J.L. Viviente J.I. Oñate C. Gómez‐Aleixandre O. Sánchez

Year: 1993 Journal: Diamond and Related Materials Vol: 2 (5-7)Pages: 933-938 Publisher: Elsevier BV

DOI: 10.1016/0925-9635(93)90253-x

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Keywords:

Diamond Auger electron spectroscopy Raman spectroscopy Chemical vapor deposition Microstructure Materials science Carbon film Plasma-enhanced chemical vapor deposition Analytical Chemistry (journal) Scanning electron microscope Thin film Indentation hardness Deposition (geology) Silicon Material properties of diamond Composite material Chemistry Nanotechnology Metallurgy Optics

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Lubricants and Their Additives

Physical Sciences → Engineering → Mechanical Engineering

Micromechanical properties of diamond films deposited by microwave-plasma-enhanced chemical vapour deposition

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