Al2O3–Gd2O3 double-films grown on graphene directly by H2O-assisted atomic layer deposition

Li Zheng; Xinhong Cheng; Duo Cao; Dongliang Zhang; Zhongjian Wang; Dawei Xu; Chao Xia; Lingyan Shen; Yuehui Yu

doi:10.1039/c4ra07144a

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Al₂O₃–Gd₂O₃ double-films grown on graphene directly by H₂O-assisted atomic layer deposition

Li Zheng Xinhong Cheng Duo Cao Dongliang Zhang Zhongjian Wang Dawei Xu Chao Xia Lingyan Shen Yuehui Yu

Year: 2014 Journal: RSC Advances Vol: 4 (83)Pages: 44296-44301 Publisher: Royal Society of Chemistry

DOI: 10.1039/c4ra07144a

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Abstract

Al₂O₃–Gd₂O₃ double-films were directly grown on graphene with the assistance of H₂O by atomic layer deposition without any functionalization.

Keywords:

Atomic layer deposition Graphene Deposition (geology) Materials science Layer (electronics) Nanotechnology Analytical Chemistry (journal) Chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Graphene research and applications

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Al₂O₃–Gd₂O₃ double-films grown on graphene directly by H₂O-assisted atomic layer deposition

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