Characterization of titanium nitride films deposited onto silicon

A. Armigliato; G. Celotti; A. Garulli; S. Guerri; P. Ostoja; Roberto Rosa; G. Martinelli

doi:10.1016/0040-6090(82)90158-4

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Characterization of titanium nitride films deposited onto silicon

A. Armigliato G. Celotti A. Garulli S. Guerri P. Ostoja Roberto Rosa G. Martinelli

Year: 1982 Journal: Thin Solid Films Vol: 92 (4)Pages: 341-346 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(82)90158-4

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Keywords:

Materials science Titanium nitride Titanium Sputtering Nitride Silicon nitride Annealing (glass) Silicon Characterization (materials science) Evaporation Thin film Chemical engineering Nanotechnology Metallurgy Layer (electronics)

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Characterization of titanium nitride films deposited onto silicon

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