Optical characterization of silicon nitride films deposited by ECR-CVD

Sergio Alfonso Pérez‐García; Jarad Martin; I. Mártil; G. González-Dı́az

doi:10.1016/0042-207x(94)90013-2

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Optical characterization of silicon nitride films deposited by ECR-CVD

Sergio Alfonso Pérez‐García Jarad Martin I. Mártil G. González-Dı́az

Year: 1994 Journal: Vacuum Vol: 45 (10-11)Pages: 1027-1028 Publisher: Elsevier BV

DOI: 10.1016/0042-207x(94)90013-2

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Keywords:

Characterization (materials science) Silicon nitride Nitride Materials science Optoelectronics Nanotechnology Silicon Engineering physics Engineering Layer (electronics)

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Optical characterization of silicon nitride films deposited by ECR-CVD

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