JOURNAL ARTICLE

Deep levels in GaAs heteroepitaxial layers grown on (100) Ge substrates by MOCVD

Yoshihiro KobayashiKosuke IkedaYukinobu Shinoda

Year: 1987 Journal:   Electronics Letters Vol: 23 (5)Pages: 242-244   Publisher: Institution of Engineering and Technology

Abstract

Deep levels in MOCVD-grown GaAs/(100)Ge were studied by the deep-level Fourier spectroscopy (DLFS) method. Single domain wafers contain EL2 similar to homoepitaxial wafers. EL2 was not observed in antiphase domain wafers, where detected deep traps were found to consist of more than two traps.

Keywords:
Metalorganic vapour phase epitaxy Wafer Materials science Optoelectronics Epitaxy Domain (mathematical analysis) Nanotechnology Layer (electronics) Mathematics

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Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor Quantum Structures and Devices
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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