Doping Effects in Co-deposited Mixed Phase Films of Hydrogenated Amorphous Silicon Containing Nanocrystalline Inclusions

C. Blackwell; Xiaodong Pi; Uwe Kortshagen; J. Kakalios

doi:10.1557/proc-1066-a06-08

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Doping Effects in Co-deposited Mixed Phase Films of Hydrogenated Amorphous Silicon Containing Nanocrystalline Inclusions

C. Blackwell Xiaodong Pi Uwe Kortshagen J. Kakalios

Year: 2008 Journal: MRS Proceedings Vol: 1066 Publisher: Cambridge University Press

DOI: 10.1557/proc-1066-a06-08

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Keywords:

Materials science Nanocrystalline silicon Nanocrystalline material Raman spectroscopy Amorphous silicon Amorphous solid Doping Silicon Thin film Analytical Chemistry (journal) Chemical engineering Nanotechnology Crystallography Crystalline silicon Optoelectronics Optics

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Doping Effects in Co-deposited Mixed Phase Films of Hydrogenated Amorphous Silicon Containing Nanocrystalline Inclusions

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