Zno-based thin films synthesized by atmospheric pressure mist chemical vapor deposition

Jianguo Lü; Toshiyuki Kawaharamura; Hiroyuki Nishinaka; Yoshihiro Kamada; Tamiko Ohshima; Shizυo Fujita

doi:10.1016/j.jcrysgro.2006.10.251

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Zno-based thin films synthesized by atmospheric pressure mist chemical vapor deposition

Jianguo Lü Toshiyuki Kawaharamura Hiroyuki Nishinaka Yoshihiro Kamada Tamiko Ohshima Shizυo Fujita

Year: 2007 Journal: Journal of Crystal Growth Vol: 299 (1)Pages: 1-10 Publisher: Elsevier BV

DOI: 10.1016/j.jcrysgro.2006.10.251

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Keywords:

Mist Chemical vapor deposition Thin film Atmospheric pressure Combustion chemical vapor deposition Materials science Chemical engineering Deposition (geology) Vapor pressure Mineralogy Chemistry Analytical Chemistry (journal) Carbon film Nanotechnology Environmental chemistry Meteorology Organic chemistry Geology Physics

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Zno-based thin films synthesized by atmospheric pressure mist chemical vapor deposition

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