JOURNAL ARTICLE

Deep reactive ion etching of sub-micrometer trenches with ultra high aspect ratio

Keywords:
Deep reactive-ion etching Aspect ratio (aeronautics) Micrometer Trench Etching (microfabrication) Materials science Figure of merit Reactive-ion etching Optoelectronics Isotropic etching Nanotechnology Optics Physics

Metrics

67
Cited By
4.54
FWCI (Field Weighted Citation Impact)
19
Refs
0.96
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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