JOURNAL ARTICLE

Annealing behavior of silicon nitride and silicon oxynitride films prepared by ECR plasma CVD method

Keywords:
Electron cyclotron resonance Annealing (glass) Silicon nitride Materials science Silicon oxynitride Nitride Microwave Electron paramagnetic resonance Silicon Analytical Chemistry (journal) Plasma Chemistry Optoelectronics Nanotechnology Nuclear magnetic resonance Composite material

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FWCI (Field Weighted Citation Impact)
1
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0.68
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Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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