Deposition of smooth, oriented diamond films using microwave plasma chemical vapor deposition

F. G. Celii; Daniel D. White; A. J. Purdes

doi:10.1016/0040-6090(92)90512-a

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Deposition of smooth, oriented diamond films using microwave plasma chemical vapor deposition

F. G. Celii Daniel D. White A. J. Purdes

Year: 1992 Journal: Thin Solid Films Vol: 212 (1-2)Pages: 140-149 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(92)90512-a

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Keywords:

Chemical vapor deposition Diamond Microcrystalline Deposition (geology) Volumetric flow rate Torr Grain size Analytical Chemistry (journal) Materials science Chemistry Silicon Carbon film Thin film Nanotechnology Composite material Metallurgy Crystallography Thermodynamics Geology Environmental chemistry

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0.91

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Topics

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

High-pressure geophysics and materials

Physical Sciences → Earth and Planetary Sciences → Geophysics

Deposition of smooth, oriented diamond films using microwave plasma chemical vapor deposition

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Citation History

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