Critical investigation on hydrogen bonding by Fourier Transform Infrared spectroscopy in hydrogenated amorphous silicon thin films

Habibuddin Shaik; G. Mohan Rao

doi:10.1016/j.jnoncrysol.2013.04.062

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Critical investigation on hydrogen bonding by Fourier Transform Infrared spectroscopy in hydrogenated amorphous silicon thin films

Habibuddin Shaik G. Mohan Rao

Year: 2013 Journal: Journal of Non-Crystalline Solids Vol: 375 Pages: 88-94 Publisher: Elsevier BV

DOI: 10.1016/j.jnoncrysol.2013.04.062

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Keywords:

Sputtering Materials science Amorphous solid Fourier transform infrared spectroscopy Microstructure Sputter deposition Thin film Silicon Analytical Chemistry (journal) Vacancy defect Void (composites) Hydrogen Crystallography Optoelectronics Composite material Nanotechnology Optics Chemistry Organic chemistry Physics

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Glass properties and applications

Physical Sciences → Materials Science → Ceramics and Composites

Metallic Glasses and Amorphous Alloys

Physical Sciences → Engineering → Mechanical Engineering

Critical investigation on hydrogen bonding by Fourier Transform Infrared spectroscopy in hydrogenated amorphous silicon thin films

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