Characterization of microvoids in thin hydrogenated amorphous silicon layers by spectroscopic ellipsometry and Fourier transform infrared spectroscopy

Wenzhu Liu; Liping Zhang; Fanying Meng; Wanwu Guo; Jian Bao; Jinning Liu; Dongliang Wang; Zhengxin Liu

doi:10.1016/j.scriptamat.2015.05.018

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Characterization of microvoids in thin hydrogenated amorphous silicon layers by spectroscopic ellipsometry and Fourier transform infrared spectroscopy

Wenzhu Liu Liping Zhang Fanying Meng Wanwu Guo Jian Bao Jinning Liu Dongliang Wang Zhengxin Liu

Year: 2015 Journal: Scripta Materialia Vol: 107 Pages: 50-53 Publisher: Elsevier BV

DOI: 10.1016/j.scriptamat.2015.05.018

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Keywords:

Materials science Fourier transform infrared spectroscopy Ellipsometry Fourier transform spectroscopy Analytical Chemistry (journal) Infrared Infrared spectroscopy Spectroscopy Amorphous solid Microstructure Silicon Wafer Thin film Optics Optoelectronics Crystallography Composite material Nanotechnology Chemistry

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Characterization of microvoids in thin hydrogenated amorphous silicon layers by spectroscopic ellipsometry and Fourier transform infrared spectroscopy

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