JOURNAL ARTICLE

Plasma-enhanced deposition of silicon oxynitride films

J.E. SchoenholtzDennis W. Hess

Year: 1987 Journal:   Thin Solid Films Vol: 148 (3)Pages: 285-291   Publisher: Elsevier BV
Keywords:
Silicon oxynitride Rutherford backscattering spectrometry Chemical vapor deposition Analytical Chemistry (journal) Deposition (geology) Silicon Nitrogen Refractive index Plasma-enhanced chemical vapor deposition Oxygen Materials science Hydrogen Thin film Chemistry Nanotechnology Silicon nitride Environmental chemistry Metallurgy Optoelectronics

Metrics

14
Cited By
1.81
FWCI (Field Weighted Citation Impact)
10
Refs
0.86
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry
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