YBaCuO thin films deposited by ion beam sputtering assisted by implantation of: O, Ne, Ar, Cu, Kr, Xe and Ba

JOURNAL ARTICLE

Year: 1993 Journal: Journal of Alloys and Compounds Vol: 195 Pages: 259-262 Publisher: Elsevier BV

DOI: 10.1016/0925-8388(93)90734-5

Keywords:

Sputtering Materials science Thin film Ion Ion implantation Ion beam Analytical Chemistry (journal) Chemistry Atomic physics Nanotechnology Physics

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