JOURNAL ARTICLE

Epitaxial Growth of BeZnSe on CaF2/Si(111) Substrate

Takeo MaruyamaNaoto NakamuraM. Watanabe

Year: 2002 Journal:   Japanese Journal of Applied Physics Vol: 41 (Part 2, No. 8A)Pages: L876-L877   Publisher: Institute of Physics

Abstract

We have studied the growth of the II-VI compounds semiconductor BeZnSe on CaF2/Si(111) substrate by molecular beam epitaxy. A single crystalline BeZnSe layer was grown at 240°C. (111) peaks of X-ray diffraction confirmed that the BeZnSe is lattice matched to Si when the Be-content is 0.45, which is consistent with Vegard's law. The surface morphology was studied using an atomic force microscopy.

Keywords:
Epitaxy Molecular beam epitaxy Substrate (aquarium) Atomic force microscopy Crystallography Materials science Diffraction Layer (electronics) Lattice (music) Chemistry Nanotechnology Optics Physics

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Citation History

Topics

Chalcogenide Semiconductor Thin Films
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Semiconductor Quantum Structures and Devices
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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