Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

Jean‐Éric Bourée; Sandesh Jadkar; Samir Kasouit; R. Vanderhaghen

doi:10.1016/j.tsf.2005.07.140

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Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

Jean‐Éric Bourée Sandesh Jadkar Samir Kasouit R. Vanderhaghen

Year: 2005 Journal: Thin Solid Films Vol: 501 (1-2)Pages: 133-136 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2005.07.140

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Keywords:

Chemical vapor deposition Microcrystalline Silicon Analytical Chemistry (journal) Tungsten Thin film Silane Substrate (aquarium) Hydrogen Amorphous solid Chemistry Deposition (geology) Atmospheric temperature range Materials science Crystallography Nanotechnology Metallurgy Composite material

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

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