Cat-CVD SiN passivation films for OLEDs and packaging

Akira Heya; Toshiharu Minamikawa; Toshikazu Niki; Shigehira Minami; Atsushi Masuda; Hironobu Umemoto; Naoto Matsuo; Hideki Matsumura

doi:10.1016/j.tsf.2007.06.220

JOURNAL ARTICLE

Cat-CVD SiN passivation films for OLEDs and packaging

Akira Heya Toshiharu Minamikawa Toshikazu Niki Shigehira Minami Atsushi Masuda Hironobu Umemoto Naoto Matsuo Hideki Matsumura

Year: 2007 Journal: Thin Solid Films Vol: 516 (5)Pages: 553-557 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2007.06.220

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Keywords:

OLED Passivation Materials science Chemical vapor deposition Silicon nitride Optoelectronics Diode Light-emitting diode Moisture Silicon Composite material Layer (electronics)

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Electrostatic Discharge in Electronics

Physical Sciences → Engineering → Electrical and Electronic Engineering

Cat-CVD SiN passivation films for OLEDs and packaging

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