Effect of substrate temperature on microstructure and optical properties of hydrogenated nanocrystalline Si thin films grown by plasma enhanced chemical vapor deposition

Sana Ben Amor; Malek Atyaoui; R. Bousbih; Ikbel Haddadi; Wissem Dimassi; Hatem Ezzaouia

doi:10.1016/j.solener.2014.06.024

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Effect of substrate temperature on microstructure and optical properties of hydrogenated nanocrystalline Si thin films grown by plasma enhanced chemical vapor deposition

Sana Ben Amor Malek Atyaoui R. Bousbih Ikbel Haddadi Wissem Dimassi Hatem Ezzaouia

Year: 2014 Journal: Solar Energy Vol: 108 Pages: 126-134 Publisher: Elsevier BV

DOI: 10.1016/j.solener.2014.06.024

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Keywords:

Nanocrystalline material Materials science Microstructure Thin film Chemical vapor deposition Substrate (aquarium) Plasma Chemical engineering Plasma-enhanced chemical vapor deposition Deposition (geology) Composite material Optoelectronics Nanotechnology

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Effect of substrate temperature on microstructure and optical properties of hydrogenated nanocrystalline Si thin films grown by plasma enhanced chemical vapor deposition

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