Room-temperature epitaxial growth of NiO(111) thin films by pulsed laser deposition

Yoshiharu Kakehi; Satoru Nakao; Kazuo Satoh; Tadaoki Kusaka

doi:10.1016/s0022-0248(01)01964-9

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Room-temperature epitaxial growth of NiO(111) thin films by pulsed laser deposition

Yoshiharu Kakehi Satoru Nakao Kazuo Satoh Tadaoki Kusaka

Year: 2002 Journal: Journal of Crystal Growth Vol: 237-239 Pages: 591-595 Publisher: Elsevier BV

DOI: 10.1016/s0022-0248(01)01964-9

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Keywords:

Epitaxy Non-blocking I/O Pulsed laser deposition Thin film Materials science Crystallinity Lattice constant Electron diffraction Diffraction Substrate (aquarium) Analytical Chemistry (journal) Crystallography Condensed matter physics Optoelectronics Optics Chemistry Nanotechnology Composite material Geology Physics

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Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Room-temperature epitaxial growth of NiO(111) thin films by pulsed laser deposition

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