BiFeO3 thin films prepared using metalorganic chemical vapor deposition

M. S. Kartavtseva; O. Yu. Gorbenko; A. R. Kaul; T. V. Murzina; S. А. Savinov; A. Barthélémy

doi:10.1016/j.tsf.2006.11.133

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BiFeO3 thin films prepared using metalorganic chemical vapor deposition

M. S. Kartavtseva O. Yu. Gorbenko A. R. Kaul T. V. Murzina S. А. Savinov A. Barthélémy

Year: 2007 Journal: Thin Solid Films Vol: 515 (16)Pages: 6416-6421 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2006.11.133

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Keywords:

Chemical vapor deposition Thin film Ferroelectricity Bismuth Epitaxy Analytical Chemistry (journal) Curie temperature Metalorganic vapour phase epitaxy Materials science Single crystal Thermal stability Chemistry Mineralogy Dielectric Crystallography Nanotechnology Optoelectronics Organic chemistry Condensed matter physics Metallurgy

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Multiferroics and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Underwater Acoustics Research

Physical Sciences → Earth and Planetary Sciences → Oceanography

BiFeO3 thin films prepared using metalorganic chemical vapor deposition

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