Ultra-low pressure chemical vapour deposition of polycrystalline and amorphous silicon

Waqar Ahmed; D. Meakin; J. Stoëmenos; N. A. Economou; R.D. Pilkington

doi:10.1007/bf00543941

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Ultra-low pressure chemical vapour deposition of polycrystalline and amorphous silicon

Waqar Ahmed D. Meakin J. Stoëmenos N. A. Economou R.D. Pilkington

Year: 1992 Journal: Journal of Materials Science Vol: 27 (2)Pages: 479-484 Publisher: Springer Science+Business Media

DOI: 10.1007/bf00543941

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Keywords:

Materials science Polycrystalline silicon Chemical vapor deposition Crystallite Deposition (geology) Silicon Amorphous solid Amorphous silicon Chemical engineering Analytical Chemistry (journal) Optoelectronics Composite material Crystalline silicon Metallurgy Crystallography Chemistry Organic chemistry Thin-film transistor

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Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Ultra-low pressure chemical vapour deposition of polycrystalline and amorphous silicon

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