JOURNAL ARTICLE

Stability of low pressure chemical vapour deposition amorphous silicon

Marek KostanaJin JangS.M. Pietruszko

Year: 1999 Journal:   Thin Solid Films Vol: 337 (1-2)Pages: 78-81   Publisher: Elsevier BV
Keywords:
Metastability Chemical vapor deposition Materials science Doping Amorphous solid Hydrogen Amorphous silicon Silicon Deposition (geology) Chemical engineering Analytical Chemistry (journal) Chemistry Nanotechnology Crystalline silicon Optoelectronics Crystallography Organic chemistry

Metrics

4
Cited By
0.39
FWCI (Field Weighted Citation Impact)
3
Refs
0.63
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry

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