Stability of low pressure chemical vapour deposition amorphous silicon

Marek Kostana; Jin Jang; S.M. Pietruszko

doi:10.1016/s0040-6090(98)01389-3

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Stability of low pressure chemical vapour deposition amorphous silicon

Marek Kostana Jin Jang S.M. Pietruszko

Year: 1999 Journal: Thin Solid Films Vol: 337 (1-2)Pages: 78-81 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(98)01389-3

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Keywords:

Metastability Chemical vapor deposition Materials science Doping Amorphous solid Hydrogen Amorphous silicon Silicon Deposition (geology) Chemical engineering Analytical Chemistry (journal) Chemistry Nanotechnology Crystalline silicon Optoelectronics Crystallography Organic chemistry

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Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Stability of low pressure chemical vapour deposition amorphous silicon

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