Chemical nanoimprint lithography for step-and-repeat Si patterning

Abstract

Chemical nanoimprint lithography is proposed as a new nanoimprint category. The authors investigate chemical nanoimprint utilizing an electrochemical reaction based on the anodic oxidation that occurs as a result of moisture that is present between a mold and a substrate. For stable nanoimprint patterning, the authors have developed a silicon carbide mold with low resistance. The mold also has excellent surface flatness and mechanical strength. In addition, the authors have developed the prototype of chemical nanoimprinter equipped with a step-and-repeat system. The imprinter also has a temperature-humidity controller and a mold-pressure adjustment system, in addition to a voltage supply source.