Ian McMackinJin ChoiPhilip SchumakerVan‐Quynh NguyenFrank XuEcron ThompsonDaniel BabbsS. V. SreenivasanM. WattsN. E. Schumaker
Step and FlashTM Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. The current status of the S-FIL tool and process technology is presented in this paper. The specific topics that are covered include: • Residual layer control • Etch process development • Patterning of lines, contacts and posts • CD control • Defect and process life • Alignment and magnification control
Eung-Sug LeeJun‐Ho JeongYoung-suk SimKi-don KimDae‐Geun ChoiJun‐Hyuk Choi
Hyunsik YoonHye Sung ChoKahp Y. SuhKookheon Char
Christophe PérozScott DhueyM CornetMarko VoglerDeidre OlynickStefano Cabrini
Martin OttoMarkus BenderJ. ZhangAndreas FuchsT. WahlbrinkJens BoltenBernd SpangenbergH. Kurz
C. Charpin-NicolleMathias IrmscherMarcus PritschowB. VratzovH. van VossenJacques ChiaroniJean MassinP. Gubbini