JOURNAL ARTICLE

Step and Repeat UV nanoimprint lithography tools and processes

Ian McMackinJin ChoiPhilip SchumakerVan‐Quynh NguyenFrank XuEcron ThompsonDaniel BabbsS. V. SreenivasanM. WattsN. E. Schumaker

Year: 2004 Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 5374 Pages: 222-222   Publisher: SPIE

Abstract

Step and FlashTM Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. The current status of the S-FIL tool and process technology is presented in this paper. The specific topics that are covered include: • Residual layer control • Etch process development • Patterning of lines, contacts and posts • CD control • Defect and process life • Alignment and magnification control

Keywords:
Nanoimprint lithography Lithography Materials science Nanolithography Replication (statistics) Process (computing) Nanotechnology Computer science Process control Extreme ultraviolet lithography Photolithography Optoelectronics Fabrication

Metrics

55
Cited By
2.30
FWCI (Field Weighted Citation Impact)
8
Refs
0.87
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Force Microscopy Techniques and Applications
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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