Xiaotong JiangKeng Lin WongMan‐Keung FungSeung-Eui Lee
Highly transparent conductive, aluminum-doped zinc oxide (ZnO:Al) films were deposited on glass substrates by midfrequency magnetron sputtering of metallic aluminum-doped zinc target. ZnO:Al films with surface work functions between 3.7 and 4.4 eV were obtained by varying the sputtering conditions. Organic light-emitting diodes (OLEDs) were fabricated on these ZnO:Al films. A current efficiency of higher than 3.7 cd/A, was achieved. For comparison, 3.9 cd/A was achieved by the reference OLEDs fabricated on commercial indium–tin–oxide substrates.
Heungsoo KimC. M. GilmoreJ. S. HorwitzAlberto PiquéHideyuki MurataGary P. KushtoRuediger SchlafZakya H. KafafiDouglas B. Chrisey
Hui LiuYunfei LiuPengpeng XiongPing ChenHuiying LiJing-Wen HouBonan KangYu Duan
T.W. KimD. C. ChooY.S. NoW. K. ChoiEun Ha Choi
Denghui XuZhenbo DengYing XuJing XiaoChunjun LiangZhiliang PeiChao Sun
Sung Heum ParkByoung Hoon LeeJong Moon ShinSe-Young JeongSuhee SongHongsuk SuhKwanghee Lee