Ion bombardment-induced nanocrystallization of magnetron-sputtered chromium carbide thin films

Carlos Ziebert; J. Ye; Michael Stüber; S. Ulrich; Magnus Edinger; I. Barzen

doi:10.1016/j.surfcoat.2011.04.080

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Ion bombardment-induced nanocrystallization of magnetron-sputtered chromium carbide thin films

Carlos Ziebert J. Ye Michael Stüber S. Ulrich Magnus Edinger I. Barzen

Year: 2011 Journal: Surface and Coatings Technology Vol: 205 (20)Pages: 4844-4849 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2011.04.080

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Keywords:

Materials science Nanocrystalline material Amorphous solid Carbide Sputter deposition Metallurgy Microstructure Cavity magnetron Chromium carbide Thin film Argon Chromium Vanadium carbide Ion Analytical Chemistry (journal) Sputtering Crystallography Atomic physics Nanotechnology

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Advanced materials and composites

Physical Sciences → Engineering → Mechanical Engineering

Ion bombardment-induced nanocrystallization of magnetron-sputtered chromium carbide thin films

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