JOURNAL ARTICLE
Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas
Se-Geun ParkCHIN-WOO KIMHo-Young SongHyoun Woo KimJu Hyun MyungSuk-Ho JooSoon Oh ParkKYU-MANN LEE
Year: 2005 Journal: Journal of Materials Science Vol: 40 (18)Pages: 5015-5016 Publisher: Springer Science+Business Media
Keywords:
Materials science Inductively coupled plasma Etching (microfabrication) Plasma Analytical Chemistry (journal) Solid mechanics Plasma etching Nanotechnology Composite material Environmental chemistry Chemistry Nuclear physics Physics
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2
Cited By
0.00
FWCI (Field Weighted Citation Impact)
9
Refs
0.14
Citation Normalized Percentile
Is in top 1%
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Citation History
Topics
Plasma Diagnostics and Applications
Physical Sciences → Engineering → Electrical and Electronic Engineering
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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