Surfactant-mediated epitaxy of silicon germanium films on silicon (001) substrates

Tobias Wietler; J. Schmidt; Dominic Tetzlaff; E. Bugiel

doi:10.1016/j.tsf.2013.08.125

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Surfactant-mediated epitaxy of silicon germanium films on silicon (001) substrates

Tobias Wietler J. Schmidt Dominic Tetzlaff E. Bugiel

Year: 2013 Journal: Thin Solid Films Vol: 557 Pages: 27-30 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2013.08.125

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Keywords:

Germanium Epitaxy Pulmonary surfactant Silicon Materials science Antimony Dislocation Relaxation (psychology) Thin film Surface roughness Strain (injury) Crystallography Silicon-germanium Chemical engineering Nanotechnology Chemistry Optoelectronics Composite material Layer (electronics) Metallurgy

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Surface and Thin Film Phenomena

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Surfactant-mediated epitaxy of silicon germanium films on silicon (001) substrates

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