Mantu K. HudaitYizheng ZhuSteve JohnstonDeepam MauryaShashank PriyaRachel Umbel
GaAs/Ge/GaAs double heterostructures (DHs) were grown in-situ using two separate molecular beam epitaxy chambers. High-resolution x-ray rocking curve demonstrates a high-quality GaAs/Ge/GaAs heterostructure by observing Pendellösung oscillations. The kinetics of the carrier recombination in Ge/GaAs DHs were investigated using photoconductivity decay measurements by the incidence excitation from the front and back side of 15 nm GaAs/100 nm Ge/0.5 μm GaAs/(100)GaAs substrate structure. High-minority carrier lifetimes of 1.06-1.17 μs were measured when excited from the front or from the back of the Ge epitaxial layer, suggests equivalent interface quality of GaAs/Ge and Ge/GaAs. Wavelength-dependent minority carrier recombination properties are explained by the wavelength-dependent absorption coefficient of Ge.
A. WernerT. D. MoustakasM. Kunst
Y. WangN. BaruchW. I. WangM. E. CheneyC.I. HuangR. Scherer
S. StriteM. Selim ÜnlüK. AdomiGuangjun GaoAnil AgarwalAngus RockettH. Morkoç̌D. LiYuki NakamuraNobuyuki Otsuka
J. Y. LeemJeong-Sik SonC. R. LeeC. S. KimY. K. ChoHwack J. LeeS. K. NohIn-Ho Bae