Submicron device fabrication techniques utilizing amorphous silicon alloys

Katsumi Murase; T. Tamama; M. Sakaue; T. Ogino; Yoshihito Amemiya; Yoshihiko Mizushima

doi:10.1016/0022-3093(83)90386-1

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Submicron device fabrication techniques utilizing amorphous silicon alloys

Katsumi Murase T. Tamama M. Sakaue T. Ogino Yoshihito Amemiya Yoshihiko Mizushima

Year: 1983 Journal: Journal of Non-Crystalline Solids Vol: 59-60 Pages: 1211-1214 Publisher: Elsevier BV

DOI: 10.1016/0022-3093(83)90386-1

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Keywords:

Fabrication Materials science Insulator (electricity) Oxide Silicon Amorphous solid Optoelectronics Amorphous silicon Chemical vapor deposition Nanotechnology Metallurgy Crystalline silicon Chemistry Crystallography

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Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Glass properties and applications

Physical Sciences → Materials Science → Ceramics and Composites

Submicron device fabrication techniques utilizing amorphous silicon alloys

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