JOURNAL ARTICLE

Migration-enhanced epitaxy growth and characterization of high quality ZnSe/GaAs superlattices

Sankaran RameshNobuhiko P. KobayashiYoshiji Horíkoshi

Year: 1990 Journal:   Applied Physics Letters Vol: 57 (11)Pages: 1102-1104   Publisher: American Institute of Physics

Abstract

We report the growth of high quality ZnSe/GaAs superlattices by migration-enhanced epitaxy (MEE) and their characterization using x-ray diffraction, electron microscopy, and photoluminescence. A streaky reflection high-energy electron diffraction (RHEED) pattern and strong, persistent RHEED oscillation during the MEE growth of the superlattices indicate a smooth growing surface. The sharp satellite peaks observed clearly in the double-crystal x-ray diffraction rocking curve of a 21-period ZnSe/GaAssuperlattice confirm the excellent crystalline and interfacial quality of the superlattice. Cross-section high-resolution electron microscopy indicates coherent lattice arrangement and abrupt interface at ZnSe-on-GaAs as well as GaAs-on-ZnSe heterointerfaces. Photoluminescence spectra from a superlattice with a periodicity of 40 nm show a strong peak at a wavelength of 829.5 nm with a linewidth of 6.3 meV at a temperature of 10 K; we believe this to be the first observation of photoluminescence from any multilayer structure involving GaAs-on-ZnSe growth.

Keywords:
Photoluminescence Reflection high-energy electron diffraction Superlattice Electron diffraction Laser linewidth Epitaxy Materials science Molecular beam epitaxy Diffraction Condensed matter physics Optoelectronics Optics Crystallography Chemistry Laser Physics Nanotechnology Layer (electronics)

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