JOURNAL ARTICLE
Post-CMP Megasonic Cleaning Using Dilute SCI Solution
Ahmed BusnainaN. MoumenJ. PiboontumM. Guarrera
Year: 1999 Journal: MRS Proceedings Vol: 566 Publisher: Cambridge University Press
Keywords:
Wafer Materials science Slurry Ultrasonic sensor Wet cleaning Particle (ecology) Chemical-mechanical planarization Silicone Layer (electronics) Process engineering Chemical engineering Composite material Optoelectronics Acoustics
Metrics
1
Cited By
0.38
FWCI (Field Weighted Citation Impact)
4
Refs
0.59
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Advanced Surface Polishing Techniques
Physical Sciences → Engineering → Biomedical Engineering
Microfluidic and Bio-sensing Technologies
Physical Sciences → Engineering → Biomedical Engineering
Laser Material Processing Techniques
Physical Sciences → Engineering → Computational Mechanics
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