JOURNAL ARTICLE

Photoluminescence and Gain of MBE Grown Cubic InxGa1—xN/GaN Heterostructures

Abstract

We report on the molecular beam epitaxy of cubic InxGa1—xN/GaN heterostructures with different In contents. High resolution X-ray diffraction (HRXRD) measurements gave the In content in the layers. Reciprocal space mapping of the symmetrical (002) and asymmetrical (113) reflection reveal that cubic InxGa1—xN with low In content (x < 0.2) is single phase whereas layers with higher In content show evidence of phase separation. The photoluminescence (PL) of the InxGa1—xN layers was measured at 2 K. The full width at half maximum of the PL is as low as 200 meV for single phase layers whereas the emission is significantly broadened for phase separated InxGa1—xN. Optical gain measurements revealed a maximum gain of about 70 cm—1 from InxGa1—xN (x = 0.07) and a decrease of the gain with increasing In content.

Keywords:
Photoluminescence Reciprocal lattice Heterojunction Materials science Molecular beam epitaxy Phase (matter) Full width at half maximum Diffraction Epitaxy Optoelectronics Crystallography Optics Chemistry Physics Nanotechnology Layer (electronics)

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Topics

GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Ga2O3 and related materials
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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