JOURNAL ARTICLE

Asymmetry ridge structure fabrication and reactive ion etching of LiNbO3

Wooseok YangH.-Y. LeeW.K. KimDae Ho Yoon

Year: 2005 Journal:   Optical Materials Vol: 27 (10)Pages: 1642-1646   Publisher: Elsevier BV
Keywords:
Materials science Reactive-ion etching Fabrication Etching (microfabrication) Lithium niobate Dry etching Optoelectronics Planar Optics Impedance matching Surface roughness Waveguide Bandwidth (computing) Surface micromachining Electrical impedance Nanotechnology Electrical engineering Composite material

Metrics

30
Cited By
1.29
FWCI (Field Weighted Citation Impact)
6
Refs
0.82
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor Lasers and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Photonic and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced Fiber Laser Technologies
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
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