Asymmetry ridge structure fabrication and reactive ion etching of LiNbO3

Wooseok Yang; H.-Y. Lee; W.K. Kim; Dae Ho Yoon

doi:10.1016/j.optmat.2004.11.010

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Asymmetry ridge structure fabrication and reactive ion etching of LiNbO3

Wooseok Yang H.-Y. Lee W.K. Kim Dae Ho Yoon

Year: 2005 Journal: Optical Materials Vol: 27 (10)Pages: 1642-1646 Publisher: Elsevier BV

DOI: 10.1016/j.optmat.2004.11.010

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Keywords:

Materials science Reactive-ion etching Fabrication Etching (microfabrication) Lithium niobate Dry etching Optoelectronics Planar Optics Impedance matching Surface roughness Waveguide Bandwidth (computing) Surface micromachining Electrical impedance Nanotechnology Electrical engineering Composite material

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Semiconductor Lasers and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Fiber Laser Technologies

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Asymmetry ridge structure fabrication and reactive ion etching of LiNbO3

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