Ridge structure etching of LiNbO3 crystal for optical waveguide applications

W.J. Park; Wooseok Yang; W.K. Kim; H.Y. Lee; Jae‐Won Lim; M. Isshiki; Dae Ho Yoon

doi:10.1016/j.optmat.2004.07.023

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Ridge structure etching of LiNbO3 crystal for optical waveguide applications

W.J. Park Wooseok Yang W.K. Kim H.Y. Lee Jae‐Won Lim M. Isshiki Dae Ho Yoon

Year: 2005 Journal: Optical Materials Vol: 28 (3)Pages: 216-220 Publisher: Elsevier BV

DOI: 10.1016/j.optmat.2004.07.023

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Keywords:

Etching (microfabrication) Dry etching Reactive-ion etching Scanning electron microscope Surface roughness Materials science Surface finish Microelectromechanical systems Crystal (programming language) Fabrication Optics Analytical Chemistry (journal) Optoelectronics Nanotechnology Chemistry Composite material Layer (electronics)

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Semiconductor Lasers and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Fiber Optic Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ridge structure etching of LiNbO3 crystal for optical waveguide applications

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