Properties of CdS films deposited by the electron beam evaporation technique

K. Sivaramamoorthy; S. Asath Bahadur; M. Kottaisamy; K. R. Murali

doi:10.1016/j.jallcom.2010.04.227

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Properties of CdS films deposited by the electron beam evaporation technique

K. Sivaramamoorthy S. Asath Bahadur M. Kottaisamy K. R. Murali

Year: 2010 Journal: Journal of Alloys and Compounds Vol: 503 (1)Pages: 170-176 Publisher: Elsevier BV

DOI: 10.1016/j.jallcom.2010.04.227

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Keywords:

Materials science Electron beam physical vapor deposition Crystallite Substrate (aquarium) Thin film Band gap Evaporation Photoconductivity Optoelectronics Analytical Chemistry (journal) Doping Deposition (geology) Chemical vapor deposition Optics Nanotechnology Chemistry Metallurgy

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Quantum Dots Synthesis And Properties

Physical Sciences → Materials Science → Materials Chemistry

Chalcogenide Semiconductor Thin Films

Physical Sciences → Engineering → Electrical and Electronic Engineering

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Properties of CdS films deposited by the electron beam evaporation technique

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