JOURNAL ARTICLE

Molecular beam epitaxy of CdF2 layers on CaF2(111) and Si(111)

N. S. SokolovS. V. GastevС. В. НовиковN.L. YakovlevAkira IzumiSeijiro Furukawa

Year: 1994 Journal:   Applied Physics Letters Vol: 64 (22)Pages: 2964-2966   Publisher: American Institute of Physics

Abstract

Cadmium fluoride single crystal layers have been grown on CaF2/Si(111) or Si(111) substrates by molecular beam epitaxy. The structures are expected to have attractive electronic properties. The growth was monitored by reflections high energy electron diffraction (RHEED) techniques. A distinct (√3×√3) R30° superstructure has been observed on the CdF2(111) surface at growth temperatures below 150 °C. RHEED intensity oscillations indicate a two-dimensional growth mode of CdF2.

Keywords:
Reflection high-energy electron diffraction Molecular beam epitaxy Electron diffraction Superstructure Crystal growth Crystallography Epitaxy Chemistry Materials science Crystal (programming language) Diffraction Optics Nanotechnology Physics Layer (electronics)

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18
Cited By
2.67
FWCI (Field Weighted Citation Impact)
9
Refs
0.91
Citation Normalized Percentile
Is in top 1%
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Citation History

Topics

Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Particle accelerators and beam dynamics
Physical Sciences →  Engineering →  Aerospace Engineering
Electron and X-Ray Spectroscopy Techniques
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films

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