JOURNAL ARTICLE

A new silicon nitride mask technology for synchrotron radiation x-ray lithography: First results

Keywords:
X-ray lithography Lithography Resist Materials science Silicon nitride Synchrotron radiation Next-generation lithography Extreme ultraviolet lithography Silicon Optoelectronics Optics Photolithography Blank Nitride Electron-beam lithography Nanotechnology Physics Layer (electronics)

Metrics

6
Cited By
0.45
FWCI (Field Weighted Citation Impact)
6
Refs
0.65
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Electron and X-Ray Spectroscopy Techniques
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films

Related Documents

JOURNAL ARTICLE

The development of a silicon nitride mask technology for synchrotron radiation X-ray lithography

C.C.G. VisserJ.E. UglowD.W. BurnsG Margaret WellsR. RedaelliF. CerrinaH. Guckel

Journal:   Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment Year: 1988 Vol: 266 (1-3)Pages: 686-690
JOURNAL ARTICLE

Large-area silicon–nitride mask technology for x-ray lithography

Dong QingyunZhang LiankuiMengzhen ChenMa Junru

Journal:   Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Year: 1989 Vol: 7 (6)Pages: 1600-1602
JOURNAL ARTICLE

X-ray phase-shift mask for proximity x-ray lithography with synchrotron radiation

Mizunori EzakiKen-ichi Murooka

Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Year: 1999 Vol: 3748 Pages: 462-462
JOURNAL ARTICLE

X‐Ray Lithography Mask Technology

W. D. BuckleyJ. F. NesterH. Windischmann

Journal:   Journal of The Electrochemical Society Year: 1981 Vol: 128 (5)Pages: 1116-1120
JOURNAL ARTICLE

Thermal Distortion of an X-Ray Mask for Synchrotron Radiation Lithography

Jinfeng YangEijiro ToyotaShunichi KAWACHI

Journal:   Japanese Journal of Applied Physics Year: 1998 Vol: 37 (12S)Pages: 6804-6804
© 2026 ScienceGate Book Chapters — All rights reserved.