Yanlong GuoXiaoqing YuanShuyun WangLU Chang-yongXiaobing WangYong ChengHai-Yuan CaoXu Liu
Hydrogen-free DLC films has been deposited by femtosecond laser pulse onto (1 0 0) p-type silicon substrates. The laser used for deposition has a pulse energy from 0.4mJ to1.6mJ and pulse width of about 50 fs with the repetition rate of 1 kHz. The laser intensities on the target are from 0.7×1014W/cm2 to 2.8×1014W/cm2. Uniform and wear-resistant DLC films is deposited with fs laser ablating a high purity graphite target at room temperature in vacuum. It is shown that the films has a good hardness ranged from 20 GPa to 30 GPa. Raman spectroscopy, X-ray Photoelectron Spectroscopy and micro-hardness are used to analyze the comprehensive performance of the films, and the results show that the films deposited at the laser intensity of 1.4×1014W/cm2 has better hardness and a higher sp3 content. The sp3 fraction of the films is estimated to be as high as 45.6%.
Dongsheng YaoJingru LiuLi Ge WangYu ChangxuanRu-Juan Zhan
Naoki YasumaruK. MiyazakiJunsuke Kiuchi
Feng QianR. K. SinghS. K. DuttaP. P. PronkoW. H. Weber
G. DumitruValerio RomanoH. P. WeberS.M. PimenovT. V. KononenkoM. SentísJörg HermannSébastien Bruneau
Nikoletta JegenyésZsolt TóthB. HoppJ. KlebniczkiZsolt BorC. Fotakis