Raghu N. BhattacharyaJun ChenPriscila SpagnolTapas K. Chaudhuri
Nonvacuum electrodeposition was used to prepare biaxially textured Ni coatings on Ni-W substrates. The samples were characterized by X-ray diffraction (including θ/2θ, pole figures, omega scans, and phi scans), and atomic force microscopy. Pole-figure scans show that electrodeposited (ED) Ni on textured Ni-W (3 atom %) is 99.3% cube textured. Full width at half-maximum values of the ω scan and ϕ scan of the electrodeposited Ni layers were comparable to the Ni-W base substrates, indicating good biaxial texturing. The buffer structures were completed on these types of seed ED-Ni layers by pulsed-laser-deposited (PLD) We obtained a critical current density of at 75.2 K in 600 Gauss magnetic field for PLD © 2004 The Electrochemical Society. All rights reserved.
Raghu N. BhattacharyaSovannary PhokPriscila SpagnolTapas K. Chaudhuri
R. N. BhattacharyaSovannary PhokWenjun ZhaoAndrew G. Norman
Raghu N. BhattacharyaSovannary PhokYongli XuR. S. Bhattacharya
Raghu N. BhattacharyaSovannary PhokYongli XuRaghu N. Bhattacharya