JOURNAL ARTICLE

Laser-induced back ablation of aluminum thin films using picosecond laser pulses

A. B. BullockPaul R. Bolton

Year: 1999 Journal:   Journal of Applied Physics Vol: 85 (1)Pages: 460-465   Publisher: American Institute of Physics

Abstract

A study of laser-induced back ablation of aluminum thin film targets with picosecond laser pulses is reported. Ablated plume edge velocities are studied as a function of film thickness, laser pulse width, and incident laser fluence. Edge velocity results are compared to a model of total transmitted fluence incident at the substrate/film interface. A model including laser-induced avalanche ionization and multiphoton ionization mechanisms in the substrate shows a transmitted fluence limit which is consistent with observed edge velocity limits.

Keywords:
Fluence Materials science Laser Optics Laser ablation Ablation Picosecond Substrate (aquarium) Thin film Ionization X-ray laser Optoelectronics Laser power scaling Chemistry Physics

Metrics

63
Cited By
4.52
FWCI (Field Weighted Citation Impact)
11
Refs
0.94
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Laser-induced spectroscopy and plasma
Physical Sciences →  Engineering →  Mechanics of Materials
Laser-Matter Interactions and Applications
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Laser Material Processing Techniques
Physical Sciences →  Engineering →  Computational Mechanics

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