Laser-induced Back-ablation Of Aluminum Thin Films Using Ultrashort Laser Pulses

A. B. Bullock; Paul R. Bolton; R. S. Walling; Frederick J. Mayer

doi:10.1109/cleo.1997.602298

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Laser-induced Back-ablation Of Aluminum Thin Films Using Ultrashort Laser Pulses

A. B. Bullock Paul R. Bolton R. S. Walling Frederick J. Mayer

Year: 1997 Pages: 98-99

DOI: 10.1109/cleo.1997.602298

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Abstract

Conventional laser-induced front ablation at metal/vacuum interfaces is a well-known and successful technique used in processes such as pulsed laser deposition (PLD).

Keywords:

Materials science Laser Laser ablation Pulsed laser deposition Ablation X-ray laser Aluminium Optoelectronics Optics Thin film Deposition (geology) Laser power scaling Metallurgy Nanotechnology

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Laser-induced spectroscopy and plasma

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Laser-induced Back-ablation Of Aluminum Thin Films Using Ultrashort Laser Pulses

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<title>Laser-induced back-ablation of aluminum thin films using picosecond laser pulses</title>