Influence of O2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering

Susana Sério; M. E. Melo Jorge; M.J.P. Maneira; Y. Nunes

doi:10.1016/j.matchemphys.2010.12.008

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Influence of O2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering

Susana Sério M. E. Melo Jorge M.J.P. Maneira Y. Nunes

Year: 2011 Journal: Materials Chemistry and Physics Vol: 126 (1-2)Pages: 73-81 Publisher: Elsevier BV

DOI: 10.1016/j.matchemphys.2010.12.008

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Keywords:

Crystallinity Anatase Materials science Crystallite Thin film Amorphous solid Sputter deposition Sputtering Analytical Chemistry (journal) Scanning electron microscope Titanium dioxide Crystal (programming language) Chemical engineering Photocatalysis Nanotechnology Crystallography Composite material Chemistry Metallurgy

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TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Influence of O2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering

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