Cu/TiO2 thin films prepared by reactive RF magnetron sputtering

M. Sreedhar; I. Neelakanta Reddy; Parthasarathi Bera; D. Ramachandran; K. Saravanan; Arul Maximus Rabel; C. Anandan; P. Kuppusami; J. Brijitta

doi:10.1007/s00339-015-9254-5

JOURNAL ARTICLE

Cu/TiO2 thin films prepared by reactive RF magnetron sputtering

M. Sreedhar I. Neelakanta Reddy Parthasarathi Bera D. Ramachandran K. Saravanan Arul Maximus Rabel C. Anandan P. Kuppusami J. Brijitta

Year: 2015 Journal: Applied Physics A Vol: 120 (2)Pages: 765-773 Publisher: Springer Science+Business Media

DOI: 10.1007/s00339-015-9254-5

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Keywords:

X-ray photoelectron spectroscopy Thin film Materials science Anatase Crystallinity Amorphous solid Sputter deposition Analytical Chemistry (journal) Substrate (aquarium) Sputtering Band gap Scanning electron microscope Chemical engineering Photocatalysis Nanotechnology Chemistry Crystallography Optoelectronics Composite material

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Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Cu/TiO2 thin films prepared by reactive RF magnetron sputtering

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