Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films

L. Kerkache; A. Layadi; A. Mosser

doi:10.1016/j.jallcom.2009.06.103

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Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films

L. Kerkache A. Layadi A. Mosser

Year: 2009 Journal: Journal of Alloys and Compounds Vol: 485 (1-2)Pages: 46-50 Publisher: Elsevier BV

DOI: 10.1016/j.jallcom.2009.06.103

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Keywords:

X-ray photoelectron spectroscopy Materials science Thin film Analytical Chemistry (journal) Amorphous solid Indium tin oxide Substrate (aquarium) Sputtering Scanning electron microscope Partial pressure Band gap Texture (cosmology) Transmission electron microscopy Oxygen Chemistry Crystallography Nanotechnology Optoelectronics Chemical engineering Composite material

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films

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